Purpose of this work- Need for scientific foundation and technology for resist evaluation: Establish resist characterization technology, Obtain material design pointers for 16 and 11 nm node: Deeper understanding of fundamental resist characteristics, Fee

WilliamAment

Marked 10 years 8 months ago onto

Source: http://electronics.wesrch.com/paper-details/pdf-EL1SE14BIHUYX-theoretical-study-on-stochastic-effects-in-chemically-amplified-resist-process-for-extreme-ultraviolet-lithography#page1

Category: Links

Purpose of this work- Need for scientific foundation and technology for resist evaluation: Establish resist characterization technology, Obtain material design pointers for 16 and 11 nm node: Deeper understanding of fundamental resist characteristics, Feedback to EUV resist material and process development.

You may like

electronics.wesrch.com