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The electron beam lithography system, in theory, operates on a basic principle. The EBL operating concept is comparable to that of photolithography in certain ways. As a result, an electron-focused beam is scanned across the substrate coated by an electron-sensitive substance known as the resist. The resist's solubility qualities alter in response to the energy deposited by the electron beam. Developing will eliminate the parts that have been exposed or have not been subjected to the resist tone. https://discheminc.com/e-beam-lithography-anti-charging-agents/
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